磁控溅射法沉积TCO薄膜的电源技术
作者：陈宇 广东志成冠军集团有限公司 上传时间：2012/9/14 16:31:42
摘要：电源在磁控溅射法制备透明导电氧化物（TCO）薄膜的技术中起着重要的作用。本文重点介绍了磁控溅射TCO薄膜的电源技术发展现状及进展，首先简要说明了目前应用最广泛的直流电源技术及具备灭弧能力的脉冲电源技术的原理和主要优缺点。进一步的，介绍了具备快速灭弧补偿功能的新型直流电源技术和模块化电源技术。最后进一步分析了代表新一代技术的高功率脉冲磁控溅射（HPPMS）电源的基本原理和优良特性，并指出其发展所面临的挑战。
叙词：TCO薄膜 磁控溅射 电源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
叙词：TCO薄膜 磁控溅射 电源 HPPMS Abstract：The power source play an important role for magnetron sputtering of the transparent conductive oxides (TCO). This paper introduces the conventional DC power source and pulsed power source for magnetron sputtering of the TCO at first. Then the newly developed modular power source and the DC power source with a fast arc elimination function and an arc compensation technology are introduced. Furthermore, the principle, characteristic and challenge of high power pulsed magnetron sputtering HPPMSpower source which is regarded as the new generation power source of magnetron sputtering is discussed. Keyword：TCO Thin films , Magnetron sputtering , Power source , HPPMS
说明：本站会员正确输入用户名和密码进行登录系统后才能查看文章详细内容和参与评论。
－－本文摘自《电源世界》，已被阅读128954次
免责声明：本文仅代表作者个人观点，与电源在线网无关。其原创性以及文中陈述文字和内容未经本站证实，对本文以及其中全部或者部分内容、文字的真实性、完整性、及时性本站不作任何保证或承诺，请读者仅作参考，并请自行核实相关内容。
：0755-82905460 邮箱 
：关于本文的网友评论：
本文暂时还没有网友发表评论信息！
文章检索